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Si (111) 10mm dia x 0.35 mm, 1SP, N type undoped, R >1000 ohm-cm High-Throughput Coating Coating area density: 12

$32.40

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Description

Coating area density: 12

It is an excellent

This is an excellent tool to make the quality film for material research laboratories to make ceramic tape casting

the grade of suitability

This version does not include the Stainless steel vacuum flanges with valves

Si (111) 10mm dia x 0.35 mm, 1SP, N type undoped, R >1000 ohm-cm High-Throughput Coating Coating area density: 12Specifications: Single crystal: Si Conductive type: N type, undoped Resistivity: > 1000 ohm cm Size: 10 mm diameter x 0. 35 mm Orientation: (111) Polish: one side polished Surface roughness: < 5A RMS Related Products Other Crystal Wafer A Z Plasma Cleaner Wafer Containers Dicing Saw Film Coater

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