C00300 - SEMI C3 - ガスの仕様 Revision:SEMI C3-0812 - Superseded The technical content of this

The technical content of this ballot addresses the portion of the CIM Framework domain specified in SEMI E81

SEMI M51 — Test Method For Characterizing Silicon Wafers by Gate Oxide Integrity

This specification was technically approved by the Global Flat Panel Display – Equipment Committee and is the direct responsibility of the North American Flat Panel Display Committee

Potential methods for abating emissions of gaseous and particulate contaminants exhausted from semiconductor manufacturing operations at "End-of-Pipe"

and setting of test conditions

C00300 - SEMI C3 - ガスの仕様 Revision:SEMI C3-0812 - Superseded The technical content of thisglobal Gases Technical Committee2012618global Audits and Reviews Subcommittee20128www. semiviews. org www. semi. org198119996 The Gases Technical Committee SEMI1979 SEMI SEMI C3 Referenced SEMI Standards None.