P04100 - SEMI P41 - XMLによる，検査装置，修正装置およびレビュー装置間で取扱うマスク欠陥データ仕様 Revision:SEMI P41-0304E - Inactive SEMI E142-0224E (editorial revision)

SEMI E142-0224E (editorial revision)

terms used to describe the characteristics of the edge profile of silicon wafers are named and their meaning is illustrated by a schematic drawing

orgで入手可能となる。初版は1997年発行。前版は2003年11月発行。

The purpose of this Document is to provide specification for carbon tetrafluoride (CF4) that is used in the semiconductor industry

Thermal equipment

P04100 - SEMI P41 - XMLによる，検査装置，修正装置およびレビュー装置間で取扱うマスク欠陥データ仕様 Revision:SEMI P41-0304E - Inactive SEMI E142-0224E (editorial revision)NOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Global Micropatterning CommitteeJapanese Micropatterning Committee2009Japanese Regional Standards Committee20042www. semi. org20043 E 2004923 NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to