E14600 - SEMI E146 - Test Method for the Determination of Particulate Contamination from Minienvironments used for Storage and Transport of Silicon Wafers Revision:SEMI E146-0306 - Inactive SEMI E132 — Specification for

SEMI E132 — Specification for Equipment Client Authentication and Authorization

This Practice is intended for use with all silicon wafer sizes and types when measuring uniformity of film properties and characteristics

lower space requirement

Nonuniformity of the surface leads to nonuniform oxide on a wafer and causes degradation of the oxide breakdown voltage

Standardized specifications for Si feedstock materials are expected to reduce these interface problems and to enable a common understanding of material properties and terms

E14600 - SEMI E146 - Test Method for the Determination of Particulate Contamination from Minienvironments used for Storage and Transport of Silicon Wafers Revision:SEMI E146-0306 - Inactive SEMI E132 — Specification forNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. This Standard defines a test method for the determination of particulate contamination from minienvironments used for storage and transport of silicon wafers in semiconductor manufacturing. The particulate contamination